Available materials and Material Data Safety Sheets (MSDS)

• Contents

  • Acids
  • Bases
  • Solvents
  • Salts
  • Application Specific Chemicals
  • • Photolithography
    • Electron beam lithography
    • Nanoimprint Lithography System
    • 3D lithography
  • Other Chemicals
  • Gases

Acids

Buffered-oxide-etch-6-1-boe-6-1-KMG-08062010 [en]

Chromium Etchant [en]

H₂O₂ - Hydrogen peroxide [en]

HCl - Hydrochloric acid [en]

H₂SO₄ - Sulfuric acid [en]

HF - Hydrofluoric acid [en]

HNO₃ - Nitric acid [en]

Hydrofluoric acid, 49% [en]

Nichrome etchant [en]

Bases

KOH - Potassium hydroxide [en]

TMAH - Tetramethylammonium hydroxide (25%) [en]

Solvents

3M Novec 7100 [en]

Acetone [en]

Dichloromethane [en]

Developer mr-Dev 600 [en]  Entwickler mr-Dev 600 [de]  

Ethanol [en]

Ethylene glycol [en]  Ethylenglykol [de]

Isopropanol [en]

Methanol [en]

MIBK - Methyl isobutyl ketone [en]

N-Ethyl-2-pyrrolidone [en]

N,N-Dimethylformamide [en]

Xylene [en]

Salts

Lugol solution [en]

Sodium persulfate [de]

Application Specific Chemicals

Photolithography

 Nano Imprint Lithography System - EVG620 NT and Mask aligner - Karl Suss MA56

Anisole [en]

AZ 125nXT-10a Photoresist [en]

AZ 726 MIF Developer [en]

EpoCore Serie R260XXX [de]

EpoClad Serie R261XXX [de]

Hexamethyldisilazane [en]

Irgacure 819 [en]

LOR xA [en]

ma-D 330-337 [de]

ma-N 2400 [en]

ma-N 2403 [en]

ma-P 1200 [de]

MF-319 Developer [en]

Michlers Ketone [de]

Miramer M340E [en]

Miramer M1142 [en]

mr-D 374/S

mr-P 1200LIL [de]

N-Methyl-2-pyrrolidinone (NMP) [en]

OrmoComp diluted XP [en]

OrmoClearFX diluted XP [de]

OrmoDev [en]

OrmoPrime08 XP [en]

pgmea [de]

Prototyping Resin PR57-K-v.2 [en]

S1803 [en]

S1805 [en]

S1806 [en]

S1813 [en]

Standard Clear Photopolymer Resin PR48 [en]

Su-8 Resist [en]

SX AR-PC 5000/80 [en]

TI prime [en]

Electron beam lithography

Raith EBPG5150 [en]

Fox-15 (HSQ) [en]

Fox-16 (HSQ) [en]

AR 600-51 [en]

AR 600-61 [en]

AR 600-71 [en]

AR-N 7520 new [en]

AR-P 617.08 [en]

AR-P 632, 642...672 [en]

AR-P 6510 [en]

AR-PC 5090.02 [en]

AR 300-40 [en]

AR 600-546 [de]

AR 600-548 [de]

AR 600-60 [de]

EPO-TEK H20E [en]

ESpacer_300z [en]

Hydrogen silsesquioxane [en]

PMMA - Polymethyl methacrylate [en]

XR-1541-002 [en]

XR-1541-006 [en]

ZEP520 [en]

Nanoimprint Lithography System

EVG620 NT

EVGASL 1 [en]

EVGNIL UV/AS1 [en]

EVGNIL UV/A2 [en]

EVGPRIM K [en]

3D lithography

 Nanoscribe Photonic Professional GT

IP-Dip Photoresist [en]

IP-L 780 Photoresist [en]

IP-n162 [en]

IP-S Photoresist [en]

Other Chemicals

4-Aminobenzophenone [de]

3-Aminopropyltriethoxysilan [de]

2-Benzyl-2-(dimethylamino)-4'-morpholinobutyrophenon [de]

4,4'-Bis-(diethylamino)-benzophenone [de]

2-Chlorothioxanthen-9-one [de]

2,2-Dimethoxy-2-phenylacetophenone [de]

Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxid [de]

Ethylene glycol [en]  Ethylenglykol [de]

Immersol 518F [en]

Phenyl-bis-(2,4,6-trimethylbenzoyl)-phosphinoxid [de]

Pyrromethene 597 [en]

Qdot 705 ITK [en]

Rhodamine 590 Chloride [en]

Rhodamine 590 Perchlorate [en]

Tetracyanoethylene [en]

TZ-001 [en]

Gases